Open Science Research Excellence
Wong, V. , Ng, H. , Sim, F.. "Influence of Measurement System on Negative Bias Temperature Instability Characterization: Fast BTI vs Conventional BTI vs Fast Wafer Level Reliability". World Academy of Science, Engineering and Technology, International Science Index 120, International Journal of Electrical, Computer, Energetic, Electronic and Communication Engineering (2016), 10(12), 1484 - 1487.